Invention Grant
- Patent Title: Etching composition and method of manufacturing a display substrate using the system
- Patent Title (中): 蚀刻组合物及其制造方法
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Application No.: US13534502Application Date: 2012-06-27
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Publication No.: US09062244B2Publication Date: 2015-06-23
- Inventor: Hong-Sick Park , Wang-Woo Lee , Bong-Kyun Kim , O-Byoung Kwon , Kyung-Bo Shim , Sang-Hoon Jang
- Applicant: Hong-Sick Park , Wang-Woo Lee , Bong-Kyun Kim , O-Byoung Kwon , Kyung-Bo Shim , Sang-Hoon Jang
- Applicant Address: KR KR
- Assignee: SAMSUNG DISPLAY CO., LTD.,DONGWOO FINE-CHEM CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.,DONGWOO FINE-CHEM CO., LTD.
- Current Assignee Address: KR KR
- Agency: Innovation Counsel LLP
- Priority: KR10-2011-0115783 20111108
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/461 ; C09K13/04 ; C23F1/18 ; C23F1/02 ; C23F1/38 ; C23F1/44 ; C09K13/08 ; H01L21/3213 ; H01L27/12
Abstract:
An etching composition and a method of manufacturing a display substrate using the etching composition are disclosed. The etching composition includes phosphoric acid (H3PO4) of about 40% by weight to about 70% by weight, nitric acid (HNO3) of about 5% by weight to about 15% by weight, acetic acid (CH3COOH) of about 5% by weight to about 20% by weight, and a remainder of water. Thus, a metal layer including copper may be stably etched.
Public/Granted literature
- US20130115727A1 ETCHING COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SYSTEM Public/Granted day:2013-05-09
Information query
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