Invention Grant
- Patent Title: Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method
- Patent Title (中): 镜子,制造方法,曝光装置和装置制造方法
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Application No.: US13332582Application Date: 2011-12-21
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Publication No.: US09063277B2Publication Date: 2015-06-23
- Inventor: Fumitaro Masaki , Akira Miyake
- Applicant: Fumitaro Masaki , Akira Miyake
- Applicant Address: JP
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2011-000004 20110101
- Main IPC: B05D5/06
- IPC: B05D5/06 ; F21V9/04 ; G03B27/32 ; G03B27/54 ; G02B5/08 ; G03F7/20 ; G21K1/06 ; B82Y10/00

Abstract:
A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.
Public/Granted literature
- US20120170012A1 MIRROR, METHOD OF MANUFACTURING THE SAME, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2012-07-05
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