Invention Grant
- Patent Title: Method of forming pattern and laminate
- Patent Title (中): 形成图案和层压板的方法
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Application No.: US13626415Application Date: 2012-09-25
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Publication No.: US09073284B2Publication Date: 2015-07-07
- Inventor: Atsushi Hieno , Shigeki Hattori , Hiroko Nakamura , Satoshi Mikoshiba , Koji Asakawa , Masahiro Kanno , Yuriko Seino , Tsukasa Azuma
- Applicant: Atsushi Hieno , Shigeki Hattori , Hiroko Nakamura , Satoshi Mikoshiba , Koji Asakawa , Masahiro Kanno , Yuriko Seino , Tsukasa Azuma
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-209850 20110926
- Main IPC: B32B7/04
- IPC: B32B7/04 ; B82Y30/00 ; G03F7/004 ; G03F7/20 ; G03F7/075 ; G03F7/11 ; G03F7/16 ; G03F7/40
Abstract:
According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.
Public/Granted literature
- US20130078570A1 METHOD OF FORMING PATTERN AND LAMINATE Public/Granted day:2013-03-28
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