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Invention Grant
US09073296B2 Laminate structure comprising a protective layer and an exposed photopolymer layer 有权
层压结构包括保护层和暴露的光聚合物层

Laminate structure comprising a protective layer and an exposed photopolymer layer
Abstract:
The present invention relates to a laminate structure comprising a protective layer and an exposed photopolymer layer, the laminate structure being obtainable by reacting at least one radiation-curing resin I), an isocyanate-functional resin II) and a photoinitiator system III), and the radiation-curing resin I) containing ≦5% by weight of compounds having a weight-average molecular weight of 1000, the isocyanate-functional resin II) containing ≦5% by weight of compounds having a weight-average molecular weight of
Abstract(Chinese):

本发明涉及包含保护层和曝光的光聚合物层的叠层结构，层压结构可通过使至少一种辐射固化树脂I），异氰酸酯官能树脂II）和光引发剂体系III）反应获得，和 所述辐射固化树脂I）含有5重量％的重均分子量为<500且≥75重量％的化合物的重均分子量为> 1000的化合物，异氰酸酯官能化树脂 II），5重量％的重均分子量<500的化合物和含有辐射固化树脂I的保护层）至少达到80重量％，异氰酸酯官能化树脂 II）至多达到15重量％的程度。 本发明还提供了一种用于生产本发明层压结构的方法。

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