Invention Grant
- Patent Title: Method of manufacturing liquid discharge head
- Patent Title (中): 液体排放头的制造方法
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Application No.: US14247445Application Date: 2014-04-08
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Publication No.: US09073318B2Publication Date: 2015-07-07
- Inventor: Masao Yoshikawa , Keiichi Sasaki , Takeru Yasuda
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2013-094634 20130426
- Main IPC: H01L21/44
- IPC: H01L21/44 ; B41J2/14 ; B41J2/16
Abstract:
A method of manufacturing a liquid discharge head is provided. The method includes forming a heating element on a substrate in which a semiconductor element is arranged. The method further includes forming a protection layer to contact an upper surface of the heating element. Annealing is performed in a hydrogen-containing atmosphere before the step of forming the protection layer.
Public/Granted literature
- US20140322835A1 METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD Public/Granted day:2014-10-30
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