Invention Grant
US09074151B2 Plasma assisted gasification system with an indirect vacuum system
有权
具有间接真空系统的等离子辅助气化系统
- Patent Title: Plasma assisted gasification system with an indirect vacuum system
- Patent Title (中): 具有间接真空系统的等离子辅助气化系统
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Application No.: US13631049Application Date: 2012-09-28
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Publication No.: US09074151B2Publication Date: 2015-07-07
- Inventor: Christian H. A. Juvan
- Applicant: AdaptiveARC, Inc.
- Applicant Address: US CA Oceanside
- Assignee: adaptiveARC, Inc.
- Current Assignee: adaptiveARC, Inc.
- Current Assignee Address: US CA Oceanside
- Agency: Akerman LLP
- Agent Michael K. Dixon
- Main IPC: C10J3/20
- IPC: C10J3/20 ; C10J3/18 ; C10J3/34 ; C10J3/72 ; C10J3/32 ; C10J3/42

Abstract:
A plasma assisted gasification system with an indirect vacuum system for drawing syngas through a reactor vessel is disclosed. In particular, the plasma assisted gasification system is configured to draw syngas through the combustion reaction zone, the syngas collection chamber, the syngas heater and the syngas outlet in the reactor vessel. The plasma assisted gasification system may include a reactor vessel with distinct reaction zones that facilitate greater control and a more efficient system. The system may include a sealing system for a continuous feed system of a gasifier enabling an inlet opening of a feedstock system to remain open yet seal the reactor without a mechanical system. The system may include a syngas heater channeling syngas collected downstream of the carbon layer support and to the pyrolysis reaction zone. The system may further include an agitator drive assembly that prevents formation of burn channels with in the fuel.
Public/Granted literature
- US20140090297A1 PLASMA ASSISTED GASIFICATION SYSTEM WITH AN INDIRECT VACUUM SYSTEM Public/Granted day:2014-04-03
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