Invention Grant
- Patent Title: X-ray diffraction apparatus and X-ray diffraction measurement method
- Patent Title (中): X射线衍射装置和X射线衍射测定法
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Application No.: US13311228Application Date: 2011-12-05
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Publication No.: US09074992B2Publication Date: 2015-07-07
- Inventor: Tetsuya Ozawa , Ryuji Matsuo , Katsuhiko Inaba
- Applicant: Tetsuya Ozawa , Ryuji Matsuo , Katsuhiko Inaba
- Applicant Address: JP Akishima-Shi, Tokyo
- Assignee: RIGAKU CORPORATION
- Current Assignee: RIGAKU CORPORATION
- Current Assignee Address: JP Akishima-Shi, Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: JP2010-271410 20101206
- Main IPC: G01N23/207
- IPC: G01N23/207 ; G01N23/20

Abstract:
There is provided an X-ray diffraction apparatus comprising an X-ray topography device for providing a spatial geometric correspondence to an X-ray exiting from a planar region of a sample to detect the X-ray as a planar X-ray topograph, and outputting the X-ray topograph as a signal; a two-dimensional imaging device for receiving a light-image of the planar region of the sample and outputting the light-image as a signal specified by planar positional information; and a video-synthesizing arithmetic control device for generating synthesized video data on the basis of an output signal from the X-ray topograph and an output signal from the imaging device.
Public/Granted literature
- US20120140890A1 X-RAY DIFFRACTION APPARATUS AND X-RAY DIFFRACTION MEASUREMENT METHOD Public/Granted day:2012-06-07
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