Invention Grant
- Patent Title: Inspection method and apparatus of a glass substrate for imprint
- Patent Title (中): 用于印刷的玻璃基板的检查方法和装置
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Application No.: US12500308Application Date: 2009-07-09
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Publication No.: US09074994B2Publication Date: 2015-07-07
- Inventor: Masahiro Hatakeyama , Norio Kimura
- Applicant: Masahiro Hatakeyama , Norio Kimura
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2008-185236 20080716
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G01N23/225

Abstract:
A method for inspecting a glass substrate for imprint including a glass substrate with a pattern surface and a transmissive conductive film coating at least part of the pattern surface, includes an electron beam irradiation step of irradiating the pattern surface of the glass substrate for imprint disposed on a stage with an electron beam having a predetermined irradiation area; an electron detection step of simultaneously detecting electrons from the pattern surface by the electron beam irradiation by means of a detection surface with a plurality of pixels; and a defect detection step of obtaining an image of the pattern surface based on the electrons detected by the detection surface and detecting a defect of the pattern surface.
Public/Granted literature
- US20100012838A1 INSPECTION METHOD AND APPARATUS OF A GLASS SUBSTRATE FOR IMPRINT Public/Granted day:2010-01-21
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