Invention Grant
US09075013B2 Apparatus and methods for microscopy having resolution beyond the Abbe limit
有权
具有分辨率超过阿贝极限的显微镜的装置和方法
- Patent Title: Apparatus and methods for microscopy having resolution beyond the Abbe limit
- Patent Title (中): 具有分辨率超过阿贝极限的显微镜的装置和方法
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Application No.: US13871034Application Date: 2013-04-26
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Publication No.: US09075013B2Publication Date: 2015-07-07
- Inventor: David A. Markle , Hwan J. Jeong , John S. Petersen
- Applicant: Periodic Structures, Inc.
- Applicant Address: US CA Los Gatos
- Assignee: Periodic Structures, Inc.
- Current Assignee: Periodic Structures, Inc.
- Current Assignee Address: US CA Los Gatos
- Agency: Opticus IP Law PLLC
- Main IPC: H04N7/18
- IPC: H04N7/18 ; G01N21/64

Abstract:
Microscope apparatus and methods for imaging an object with a resolution beyond the Abbe limit are disclosed. The apparatus employs an object selectively patterned with a fluorescing material that is induced to fluoresce with one wavelength and inhibited from fluorescing with a second wavelength. Two orthogonal interference-fringe patterns are generated from four diffracted light beams of an inhibiting wavelength and superimposed on the object along with light that induces fluorescence. The interference-pattern image allows only sub-resolution-sized emission areas of the object to fluoresce. Multiple images of the fluorescing object are obtained, each corresponding to a slightly different position of the fringe patterns on the substrate. Each image is processed to yield a sparsely sampled super-resolution image. Multiple sparse images are interwoven to form a complete super-resolution image of the object.
Public/Granted literature
- US20130286179A1 Apparatus and methods for microscopy having resolution beyond the Abbe limit Public/Granted day:2013-10-31
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