Invention Grant
US09075309B2 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process
有权
含硅表面改性剂，含有该表面改性剂的抗蚀剂下层膜组合物和图案化工艺
- Patent Title: Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process
- Patent Title (中): 含硅表面改性剂，含有该表面改性剂的抗蚀剂下层膜组合物和图案化工艺
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Application No.: US13747154Application Date: 2013-01-22
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Publication No.: US09075309B2Publication Date: 2015-07-07
- Inventor: Tsutomu Ogihara , Takafumi Ueda , Yoshinori Taneda
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2012-029228 20120214
- Main IPC: G03F7/075
- IPC: G03F7/075 ; G03F7/09 ; G03F7/11 ; G03F7/36 ; G03F7/40 ; H01L21/302 ; C07F7/18 ; C09D183/06 ; C08G77/14
Abstract:
The present invention provides a silicon-containing surface modifier wherein the modifier contains one or more of a repeating unit shown by the following general formula (A) and a partial structure shown by the following general formula (C). The present invention has an object to provide a resist underlayer film applicable not only to a negatively developed resist pattern formed by a hydrophilic organic compound but also to a conventional positively developed resist pattern formed by a hydrophobic compound.
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