Invention Grant
- Patent Title: Manufacturing method of microstructure
- Patent Title (中): 微观结构的制造方法
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Application No.: US13850467Application Date: 2013-03-26
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Publication No.: US09075311B2Publication Date: 2015-07-07
- Inventor: Yung-Chun Lee , Chi-Cheng Chiu , Chih-Hao Chang , Ching-Yun Lu
- Applicant: NATIONAL CHENG KUNG UNIVERSITY
- Applicant Address: TW Tainan
- Assignee: NATIONAL CHENG KUNG UNIVERSITY
- Current Assignee: NATIONAL CHENG KUNG UNIVERSITY
- Current Assignee Address: TW Tainan
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F7/20

Abstract:
A manufacturing method of microstructure comprises steps of: a motion determination step which determines the motion of a substrate relative to at least a photomask; a microlens determination step which determines the profile of a microlens unit on the substrate; an analysis step which calculates the feature of the photomask according to the motion of the substrate and the profile of the microlens unit by using a numerical analysis method; a production step which produces the photomask according to the feature of the photomask; driving the substrate to do the motion determined in the motion determination step, and meanwhile making a laser light illuminate the substrate through the photomask to manufacture the microlens unit on the substrate by the superposition effect of the laser light; and performing a photolithography process by using the microlens unit to produce a microstructure on a photoresist substrate.
Public/Granted literature
- US20140295354A1 MANUFACTURING METHOD OF MICROSTRUCTURE Public/Granted day:2014-10-02
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