The present invention is directed to an exposure apparatus and photo-mask, and method for manufacturing liquid crystal display using the same. An exposure apparatus according to an exemplary embodiment of the present invention provides an exposure apparatus which includes: a first photo-mask comprising a plurality of transmission parts; and a second photo-mask comprising a plurality of transmission parts, the first photo-mask and the second photo-mask comprising an overlapping region where the first photo-mask and the second photo-mask are partially overlapped, wherein at least one transmission part included in at least one of the first photo-mask and the second photo-mask in the overlapping region comprises a semi-transmission section, and a transmittance of the semi-transmission section is greater than or equal to 0% and less than 100%.