Invention Grant
- Patent Title: Substrate treatment installation
- Patent Title (中): 基材处理装置
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Application No.: US14113472Application Date: 2012-04-27
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Publication No.: US09076635B2Publication Date: 2015-07-07
- Inventor: Harald Gross , Erwin Zschieschang
- Applicant: Harald Gross , Erwin Zschieschang
- Applicant Address: DE Dresden
- Assignee: VON ARDENNE Anlagentechnik GmbH
- Current Assignee: VON ARDENNE Anlagentechnik GmbH
- Current Assignee Address: DE Dresden
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Priority: DE102011100098 20110429; DE102011081749 20110829
- International Application: PCT/EP2012/057765 WO 20120427
- International Announcement: WO2012/146715 WO 20121101
- Main IPC: H01J1/02
- IPC: H01J1/02 ; H01J37/32 ; H01L21/67 ; H01J7/26
Abstract:
A substrate treatment installation includes an installation chamber and a light source for the exposure of substrates to light. The light source is arranged in the interior of the substrate treatment installation and includes at least one discharge lamp arranged in a housing, which is permeable to light at least in sections and has a vacuum-tight cavity for accommodating the lamp, and also at least one reflector element arranged in spatial proximity to the at least one lamp and having an electrical connection.
Public/Granted literature
- US20140070689A1 SUBSTRATE TREATMENT INSTALLATION Public/Granted day:2014-03-13
Information query
