Invention Grant
- Patent Title: Magnetic random access memory and a method of fabricating the same
- Patent Title (中): 磁性随机存取存储器及其制造方法
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Application No.: US14051404Application Date: 2013-10-10
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Publication No.: US09076720B2Publication Date: 2015-07-07
- Inventor: Hiroyuki Kanaya
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2011-021210 20110202
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119 ; H01L27/22 ; G11C11/16 ; H01L43/12

Abstract:
An aspect of the present embodiment, there is provided magnetic random access memory device including a semiconductor substrate, a selection transistor on the semiconductor substrate, the selection transistor including a diffusion layer, a contact plug on diffusion layer, an amorphous film on the contact plug, a lower electrode provided on the amorphous film, a first magnetic layer, a nonmagnetic layer, a second magnetic layer, an upper electrode stacked in an order and a sidewall contact film on the contact plug, the sidewall contact film being in contact with a sidewall of the upper electrode.
Public/Granted literature
- US20140097477A1 MAGNETIC RANDOM ACCESS MEMORY AND A METHOD OF FABRICATING THE SAME Public/Granted day:2014-04-10
Information query
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