Invention Grant
- Patent Title: Radio-frequency antenna unit and plasma processing apparatus
- Patent Title (中): 射频天线单元和等离子体处理装置
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Application No.: US12921063Application Date: 2009-03-03
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Publication No.: US09078336B2Publication Date: 2015-07-07
- Inventor: Yuichi Setsuhara , Akinori Ebe
- Applicant: Yuichi Setsuhara , Akinori Ebe
- Applicant Address: JP Yasu-shi
- Assignee: EMD CORPORATION
- Current Assignee: EMD CORPORATION
- Current Assignee Address: JP Yasu-shi
- Agency: Oliff PLC
- Priority: JP2008-054532 20080305
- International Application: PCT/JP2009/000956 WO 20090303
- International Announcement: WO2009/110226 WO 20090911
- Main IPC: H01Q1/36
- IPC: H01Q1/36 ; H05H1/46 ; H01J37/32

Abstract:
The present invention aims at providing a radio-frequency antenna unit capable of generating a high-density discharge plasma in a vacuum chamber. The radio-frequency antenna unit according to the present invention includes: a radio-frequency antenna through which a radio-frequency electric current can flow; a protective tube made of an insulator provided around the portion of the radio-frequency antenna that is in the vacuum chamber; and a buffer area provided between the radio-frequency antenna and the protective tube. The “buffer area” refers to an area where an acceleration of electrons is suppressed, and it can be formed, for example, with a vacuum or an insulator. Such a configuration can suppress an occurrence of an electric discharge between the antenna and the protective tube, enabling the generation of a high-density discharge plasma in the vacuum chamber.
Public/Granted literature
- US20110080094A1 RADIO-FREQUENCY ANTENNA UNIT AND PLASMA PROCESSING APPARATUS Public/Granted day:2011-04-07
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