Invention Grant
US09078336B2 Radio-frequency antenna unit and plasma processing apparatus 有权
射频天线单元和等离子体处理装置

  • Patent Title: Radio-frequency antenna unit and plasma processing apparatus
  • Patent Title (中): 射频天线单元和等离子体处理装置
  • Application No.: US12921063
    Application Date: 2009-03-03
  • Publication No.: US09078336B2
    Publication Date: 2015-07-07
  • Inventor: Yuichi SetsuharaAkinori Ebe
  • Applicant: Yuichi SetsuharaAkinori Ebe
  • Applicant Address: JP Yasu-shi
  • Assignee: EMD CORPORATION
  • Current Assignee: EMD CORPORATION
  • Current Assignee Address: JP Yasu-shi
  • Agency: Oliff PLC
  • Priority: JP2008-054532 20080305
  • International Application: PCT/JP2009/000956 WO 20090303
  • International Announcement: WO2009/110226 WO 20090911
  • Main IPC: H01Q1/36
  • IPC: H01Q1/36 H05H1/46 H01J37/32
Radio-frequency antenna unit and plasma processing apparatus
Abstract:
The present invention aims at providing a radio-frequency antenna unit capable of generating a high-density discharge plasma in a vacuum chamber. The radio-frequency antenna unit according to the present invention includes: a radio-frequency antenna through which a radio-frequency electric current can flow; a protective tube made of an insulator provided around the portion of the radio-frequency antenna that is in the vacuum chamber; and a buffer area provided between the radio-frequency antenna and the protective tube. The “buffer area” refers to an area where an acceleration of electrons is suppressed, and it can be formed, for example, with a vacuum or an insulator. Such a configuration can suppress an occurrence of an electric discharge between the antenna and the protective tube, enabling the generation of a high-density discharge plasma in the vacuum chamber.
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