Invention Grant
US09082612B2 Composition for forming a silica layer, method of manufacturing the composition, silica layer prepared using the composition, and method of manufacturing the silica layer
有权
用于形成二氧化硅层的组合物，制备组合物的方法，使用该组合物制备的二氧化硅层，以及制备二氧化硅层的方法
- Patent Title: Composition for forming a silica layer, method of manufacturing the composition, silica layer prepared using the composition, and method of manufacturing the silica layer
- Patent Title (中): 用于形成二氧化硅层的组合物，制备组合物的方法，使用该组合物制备的二氧化硅层，以及制备二氧化硅层的方法
-
Application No.: US13330856Application Date: 2011-12-20
-
Publication No.: US09082612B2Publication Date: 2015-07-14
- Inventor: Hui-Chan Yun , Taek-Soo Kwak , Bong-Hwan Kim , Jin-Hee Bae , Jung-Kang Oh , Sang-Hak Lim , Dong-Il Han , Sang-Kyun Kim , Jin-Wook Lee
- Applicant: Hui-Chan Yun , Taek-Soo Kwak , Bong-Hwan Kim , Jin-Hee Bae , Jung-Kang Oh , Sang-Hak Lim , Dong-Il Han , Sang-Kyun Kim , Jin-Wook Lee
- Applicant Address: KR Gumi-si, Kyeongsangbuk-do
- Assignee: CHEIL INDUSTRIES, INC.
- Current Assignee: CHEIL INDUSTRIES, INC.
- Current Assignee Address: KR Gumi-si, Kyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2010-0132734 20101222; KR10-2011-0107657 20111020
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C09D183/02 ; C08L83/16 ; B32B9/00 ; C09D183/00 ; B05D5/12 ; B05D5/00 ; C09D183/08
Abstract:
A composition for forming a silica layer, a method of manufacturing the composition, a silica layer prepared using the composition, and a method of manufacturing the silica layer, the composition including hydrogenated polysilazane, hydrogenated polysiloxazane, or a combination thereof, wherein a concentration of a sum of hydrogenated polysilazane and hydrogenated polysiloxazane having a weight average molecular weight, reduced to polystyrene, of greater than or equal to about 50,000 is about 0.1 wt % or less, based on a total amount of the hydrogenated polysilazane and hydrogenated polysiloxazane.
Public/Granted literature
Information query
IPC分类:
