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US09082729B2 Combinatorial method for solid source doping process development 有权
固体源掺杂工艺开发的组合方法

Combinatorial method for solid source doping process development
Abstract:
One or more small spot showerhead apparatus are used to provide dopant exposure and/or to deposit materials using CVD, PECVD, ALD, or PEALD on small spots in a site isolated, combinatorial manner. The small spot showerheads may be configured within a larger combinatorial showerhead to allow multi-layer film stacks to be deposited in a combinatorial manner. Anneal processes where the area of the process can be controlled such as laser annealing or site-isolated rapid thermal processing (RTP) can be used to vary the annealing conditions in a combinatorial manner.
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