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Invention Grant
US09082803B2 Substrate holding apparatus, mask alignment method, and vacuum processing apparatus using long taper pins and short taper pins for alignment 有权
基板保持装置，掩模对准方法和使用长锥销和用于对准的短锥销的真空处理装置

Substrate holding apparatus, mask alignment method, and vacuum processing apparatus using long taper pins and short taper pins for alignment
Abstract:
A mask alignment method for a substrate holding apparatus. A first engaging portion is formed in one of a substrate holder and a mask and has two protruding portions. A second engaging portion is formed in the other one of the substrate holder and the mask and has at least one protruding portion. First groove portions formed in the other one of the substrate holder and the mask engage with the protruding portions of the first engaging portion. A second groove portion formed in the other one of the substrate holder and the mask engages with the protruding portion of the second engaging portion. The mask alignment method includes the steps of (a) engaging the protruding portions of the first engaging portion with the first groove portions to align the mask with respect to the substrate holder in a first direction, and (b) engaging, after the step of engaging the protruding portions of the first engaging portion with the first groove portions, the protruding portion of the second engaging portion with the second groove portion, to align the mask with respect to the substrate holder in a direction perpendicular to the first direction.
Abstract(Chinese):

一种用于基板保持装置的掩模对准方法。 第一接合部分形成在衬底保持器和掩模之一中，并且具有两个突出部分。 第二接合部分形成在衬底保持器和掩模中的另一个中，并且具有至少一个突出部分。 形成在另一个基板保持器和掩模中的第一槽部与第一接合部的突出部接合。 形成在另一个基板保持器和掩模中的第二槽部与第二接合部的突出部接合。 掩模对准方法包括以下步骤：（a）将第一接合部分的突出部分与第一凹槽部分接合，以使掩模相对于基板保持器沿第一方向对准，并且（b）在步骤 将第一接合部分的突出部分与第一凹槽部分接合，第二接合部分的突出部分与第二凹槽部分相对于基板保持器在垂直于第一方向的方向上对准掩模。

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