Invention Grant
- Patent Title: Memory device and method for manufacturing the same
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Application No.: US13410610Application Date: 2012-03-02
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Publication No.: US09082880B2Publication Date: 2015-07-14
- Inventor: Daisuke Matsubayashi
- Applicant: Daisuke Matsubayashi
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2011-052448 20110310; JP2011-112648 20110519
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L21/84 ; H01L27/105 ; H01L27/115 ; H01L27/12 ; H01L49/02 ; H01L29/786 ; H01L27/06

Abstract:
A memory device that is as small in area as possible and has an extremely long data retention period. A transistor with extremely low leakage current is used as a cell transistor of a memory element in a memory device. Moreover, in order to reduce the area of a memory cell, the transistor is formed so that its source and drain are stacked in the vertical direction in a region where a bit line and a word line intersect each other. Further, a capacitor is stacked above the transistor.
Public/Granted literature
- US09425107B2 Memory device and method for manufacturing the same Public/Granted day:2016-08-23
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