Invention Grant
- Patent Title: Semiconductor optoelectronic structure with increased light extraction efficiency
- Patent Title (中): 半导体光电结构提高光提取效率
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Application No.: US14037386Application Date: 2013-09-26
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Publication No.: US09082934B2Publication Date: 2015-07-14
- Inventor: Shih-Cheng Huang , Po-Min Tu , Peng-Yi Wu , Wen-Yu Lin , Chih-Pang Ma , Tzu-Chien Hong , Chia-Hui Shen
- Applicant: ADVANCED OPTOELECTRONIC TECHNOLOGY, INC.
- Applicant Address: TW Hsinchu Hsien
- Assignee: ADVANCED OPTOELECTRONIC TECHNOLOGY, INC.
- Current Assignee: ADVANCED OPTOELECTRONIC TECHNOLOGY, INC.
- Current Assignee Address: TW Hsinchu Hsien
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: TW98123854A 20090715
- Main IPC: H01L33/10
- IPC: H01L33/10 ; H01L33/22 ; H01L33/36 ; H01L33/20 ; H01L33/00

Abstract:
A semiconductor optoelectronic structure with increased light extraction efficiency, includes a substrate; a buffer layer is formed on the substrate and includes a pattern having plural grooves formed adjacent to the substrate; a semiconductor layer is formed on the buffer layer and includes an n-type conductive layer formed on the buffer layer, an active layer formed on the n-type conductive layer, and a p-type conductive layer formed on the active layer; a transparent electrically conductive layer is formed on the semiconductor layer; a p-type electrode is formed on the transparent electrically conductive layer; and an n-type electrode is formed on the n-type conductive layer.
Public/Granted literature
- US20140027806A1 SEMICONDUCTOR OPTOELECTRONIC STRUCTURE WITH INCREASED LIGHT EXTRACTION EFFICIENCY Public/Granted day:2014-01-30
Information query
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