Invention Grant
- Patent Title: Polishing agent and polishing method
- Patent Title (中): 抛光剂和抛光方法
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Application No.: US14095384Application Date: 2013-12-03
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Publication No.: US09085714B2Publication Date: 2015-07-21
- Inventor: Iori Yoshida , Satoshi Takemiya , Hiroyuki Tomonaga
- Applicant: ASAHI GLASS COMPANY, LIMITED
- Applicant Address: JP Chiyoda-ku
- Assignee: ASAHI GLASS COMPANY, LIMITED
- Current Assignee: ASAHI GLASS COMPANY, LIMITED
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-125170 20110603
- Main IPC: C09K13/00
- IPC: C09K13/00 ; C09G1/02 ; H01L21/02 ; H01L21/04 ; H01L21/306
Abstract:
A polishing agent for polishing a non-oxide single-crystal substrate such as a silicon carbide single-crystal substrate with a high polishing rate to obtain a smooth surface is provided. This polishing agent comprises an oxidant having redox potential of 0.5 V or more and containing a transition metal, silicon oxide particles, cerium oxide particles and a dispersion medium, in which a mass ratio of the silicon oxide particles to the cerium oxide particles is from 0.2 to 20.
Public/Granted literature
- US20140094032A1 POLISHING AGENT AND POLISHING METHOD Public/Granted day:2014-04-03
Information query
