Invention Grant
- Patent Title: Electroforming method
- Patent Title (中): 电铸法
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Application No.: US13063638Application Date: 2009-09-11
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Publication No.: US09085828B2Publication Date: 2015-07-21
- Inventor: Kazumasa Seki , Akihiko Hatamura , Hitoshi Yoshida , Toshio Yamashita , Yasuhiro Miura
- Applicant: Kazumasa Seki , Akihiko Hatamura , Hitoshi Yoshida , Toshio Yamashita , Yasuhiro Miura
- Applicant Address: JP Kyoto
- Assignee: OMRON Corporation
- Current Assignee: OMRON Corporation
- Current Assignee Address: JP Kyoto
- Agency: Osha Liang LLP
- Priority: JP2008-251085 20080929
- International Application: PCT/JP2009/004522 WO 20090911
- International Announcement: WO2010/035417 WO 20100401
- Main IPC: C25D5/02
- IPC: C25D5/02 ; C25D1/10 ; C25D1/20 ; C25D1/00 ; H05K3/20

Abstract:
A mold is fabricated with a cavity formed in an insulating layer formed so as to be placed on an upper surface of a conductive base material. This mold is disposed in an electrolyte bath to be applied with a voltage, and a metal is electrodeposited on the bottom surface of the cavity to electroform a metal-formed product in the cavity. In this electrodepositing process, when the width of the cavity is taken as W and a vertical height of a head space between an upper opening of the cavity and an upper surface of a metal layer is taken as H, the growth of the metal layer is stopped so that the height H of the head space left above the metal layer satisfies: where 300 μm≦W; H≧W/3.75 where 200 μm≦W
Public/Granted literature
- US20110233063A1 ELECTROFORMING METHOD Public/Granted day:2011-09-29
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