Invention Grant
- Patent Title: X-ray intensity correction method and X-ray diffractometer
- Patent Title (中): X射线强度校正方法和X射线衍射仪
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Application No.: US13662082Application Date: 2012-10-26
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Publication No.: US09086367B2Publication Date: 2015-07-21
- Inventor: Toru Mitsunaga , Kazuhiko Omote , Katsuhiko Inaba
- Applicant: Rigaku Corporation
- Applicant Address: JP Tokyo
- Assignee: RIGAKU CORPORATION
- Current Assignee: RIGAKU CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2011-247327 20111111; JP2012-047247 20120302
- Main IPC: G01N23/207
- IPC: G01N23/207 ; G01N23/223 ; G01N23/20

Abstract:
An X-ray intensity correction method makes the background uniform by adjusting a raster element and an X-ray diffractometer. An X-ray intensity correction method for correcting the intensity of diffracted X-rays includes the steps of focusing X-rays on a sample for correction placed at a gonio center, entering fluorescent X-rays excited by the focused X-rays into a raster element formed by polycapillaries and having a unique focal point, detecting the fluorescent X-rays having passed through the raster element; and adjusting the arrangement of the raster element so that the fluorescent X-rays can uniformly be detected regardless of the detecting position. Since fluorescent X-rays are used, it is possible to adjust the position of the raster element because if the focal point of the raster element coincides with the gonio center, the intensity becomes uniform regardless of the detected position.
Public/Granted literature
- US20130121460A1 X-RAY INTENSITY CORRECTION METHOD AND X-RAY DIFFRACTOMETER Public/Granted day:2013-05-16
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