Invention Grant
- Patent Title: Monomer, polymer, resist composition, and patterning process
- Patent Title (中): 单体，聚合物，抗蚀剂组合物和图案化工艺
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Application No.: US13957175Application Date: 2013-08-01
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Publication No.: US09086624B2Publication Date: 2015-07-21
- Inventor: Masayoshi Sagehashi , Jun Hatakeyama , Koji Hasegawa
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2012-177800 20120810
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/38 ; C07C69/54 ; C07C69/74 ; C07C69/75 ; C07C69/78 ; C08F220/10 ; C08F220/14 ; C08F220/16 ; C08F220/24 ; C08F222/10 ; C08F222/14 ; C08F228/02 ; G03F7/038 ; C07C57/26 ; G03F7/20 ; G03F7/039
Abstract:
A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.
Public/Granted literature
- US20140045123A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS Public/Granted day:2014-02-13
Information query
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