Invention Grant
- Patent Title: Fine pattern structures having block co-polymer materials and methods of fabricating the same
- Patent Title (中): 具有嵌段共聚物材料的精细图案结构及其制造方法
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Application No.: US14229698Application Date: 2014-03-28
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Publication No.: US09086632B2Publication Date: 2015-07-21
- Inventor: Jung Hyung Lee , Cheol Kyu Bok , Keun Do Ban , Myoung Soo Kim , Ki Lyoung Lee
- Applicant: SK HYNIX INC.
- Applicant Address: KR Icheon
- Assignee: SK HYNIX INC.
- Current Assignee: SK HYNIX INC.
- Current Assignee Address: KR Icheon
- Priority: KR10-2013-0148248 20131202
- Main IPC: B44C1/22
- IPC: B44C1/22 ; C03C15/00 ; C03C25/68 ; C23F1/00 ; G03F7/40 ; G03F7/20
Abstract:
A method for fine pattern structures includes forming a pattern formation layer over a first region and a second region of a substrate, forming a first block co-polymer layer in the first region, forming a second block co-polymer layer in the second region, etching the first and second block co-polymer layers, and forming the fine pattern structure in the pattern formation layer in the first region without forming a pattern in the pattern formation layer in the second region.
Public/Granted literature
- US20150153649A1 FINE PATTERN STRUCTURES HAVING BLOCK CO-POLYMER MATERIALS AND METHODS OF FABRICATING THE SAME Public/Granted day:2015-06-04
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