Invention Grant
- Patent Title: Detection of contamination in EUV systems
- Patent Title (中): 检测EUV系统中的污染
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Application No.: US13282175Application Date: 2011-10-26
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Publication No.: US09086638B2Publication Date: 2015-07-21
- Inventor: Rik Jonckheere , Anne-Marie Goethals , Gian Francesco Lorusso , Ivan Pollentier
- Applicant: Rik Jonckheere , Anne-Marie Goethals , Gian Francesco Lorusso , Ivan Pollentier
- Applicant Address: BE Leuven
- Assignee: IMEC
- Current Assignee: IMEC
- Current Assignee Address: BE Leuven
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: EP07119107 20071023
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/54 ; G03B27/32 ; G03B27/72 ; G03F7/20 ; G03B27/68

Abstract:
A sensor for sensing contamination in an application system is disclosed. In one aspect, the sensor comprises a capping layer. The sensor is adapted to cause a first reflectivity change upon initial formation of a first contamination layer on the capping layer when the sensor is provided in the system. The first reflectivity change is larger than an average reflectivity change upon formation of a thicker contamination layer on the capping layer and larger than an average reflectivity change upon formation of an equal contamination on the actual mirrors of the optics of the system.
Public/Granted literature
- US20120099092A1 DETECTION OF CONTAMINATION IN EUV SYSTEMS Public/Granted day:2012-04-26
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