Invention Grant
- Patent Title: Manufacturing method of magnet head able to reduce electrode film for plating
- Patent Title (中): 磁头的制造方法能够减少电镀用电镀膜
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Application No.: US13845580Application Date: 2013-03-18
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Publication No.: US09087529B2Publication Date: 2015-07-21
- Inventor: Tatsuhiro Nojima , Ken Fujii
- Applicant: TDK Corporation
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Main IPC: G11B5/187
- IPC: G11B5/187 ; G11B5/127 ; G11B5/31 ; G11B5/39

Abstract:
Method for manufacturing a magnetic head includes providing a stopper layer on an upper surface of a main magnetic pole layer applying a magnetic flux to a recording medium via a first insulation layer, providing a second insulation layer on the upper surface of the first insulation layer to cover at least an entire surface of the stopper layer, covering an upper surface portion of the second insulation layer with a mask layer, forming a height difference portion by removing at least a first insulation layer portion not covered by the mask layer by etching to at least partially remove at least a stopper layer portion in a film thickness direction, and subsequently by removing the mask layer, forming a electrode film in the height difference portion, and forming a plating film, which is a magnetic shield for the main magnetic pole layer, on an upper surface of the electrode.
Public/Granted literature
- US20140268424A1 MANUFACTURING METHOD OF MAGNET HEAD ABLE TO REDUCE ELECTRODE FILM FOR PLATING Public/Granted day:2014-09-18
Information query
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