Invention Grant
US09093596B2 Epitaxial wafer for light emitting diode, light emitting diode chip and methods for manufacturing the same
有权
用于发光二极管的外延晶片,发光二极管芯片及其制造方法
- Patent Title: Epitaxial wafer for light emitting diode, light emitting diode chip and methods for manufacturing the same
- Patent Title (中): 用于发光二极管的外延晶片,发光二极管芯片及其制造方法
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Application No.: US13536784Application Date: 2012-06-28
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Publication No.: US09093596B2Publication Date: 2015-07-28
- Inventor: Dongming Huo , Hongpo Hu , Chunlin Xie , Wang Zhang
- Applicant: Dongming Huo , Hongpo Hu , Chunlin Xie , Wang Zhang
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: BYD Company Limited
- Current Assignee: BYD Company Limited
- Current Assignee Address: CN Shenzhen, Guangdong
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: CN200910215397 20091231
- Main IPC: H01L33/14
- IPC: H01L33/14 ; H01L33/08 ; H01L27/15

Abstract:
An epitaxial wafer for a light emitting diode (LED) and a method for manufacturing the same are provided. The method comprises: providing a substrate; forming a first LED epitaxial structure on a first surface of the substrate, in which the first LED epitaxial structure comprises a first n-type semiconductor layer, a first light emitting layer, a first anti-diffusion layer between the first n-type semiconductor layer and the first light emitting layer, a first p-type semiconductor layer, and a second anti-diffusion layer between the first p-type semiconductor layer and the first light emitting layer; and forming a second LED epitaxial structure on a second surface of the substrate. An LED chip comprising the epitaxial wafer and a method for manufacturing the same are also provided.
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