Invention Grant
US09096705B2 Block copolymer for manufacturing nanowire and method for manufacturing thereof
有权
用于制造纳米线的嵌段共聚物及其制造方法
- Patent Title: Block copolymer for manufacturing nanowire and method for manufacturing thereof
- Patent Title (中): 用于制造纳米线的嵌段共聚物及其制造方法
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Application No.: US13624311Application Date: 2012-09-21
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Publication No.: US09096705B2Publication Date: 2015-08-04
- Inventor: Sooiin Park , Jaephil Cho , Hyun-Kon Song , Byoungman Bang
- Applicant: UNIST Academy-Industry Research Corporation
- Applicant Address: KR Ulsan
- Assignee: UNIST ACADEMY-INDUSTRY RESEARCH CORPORATION
- Current Assignee: UNIST ACADEMY-INDUSTRY RESEARCH CORPORATION
- Current Assignee Address: KR Ulsan
- Agency: Lexyoume IP Meister, PLLC
- Priority: KR10-2010-0025399 20100322
- Main IPC: B44C1/22
- IPC: B44C1/22 ; C08F271/02 ; C08F293/00 ; C08F297/00 ; B81C1/00 ; B82Y30/00 ; B82Y40/00
Abstract:
A block copolymer for manufacturing a nanowire and a method of manufacturing the same are disclosed. The block copolymer and the method of manufacturing a nanowire using the same are used to fabricate a nanowire having a diameter of less than or equal to 30 nm and a porous nanowire having a diameter within the same range and pores with a diameter of less than or equal to 10 nm.
Public/Granted literature
- US20130020278A1 BLOCK COPOLYMER FOR MANUFACTURING NANOWIRE AND METHOD FOR MANUFACTURING THEREOF Public/Granted day:2013-01-24
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