Invention Grant
US09096722B2 Method for curing structures using a dual photoinitiator system and a structure made using the same
有权
使用双光引发剂体系固化结构的方法和使用其制造的结构
- Patent Title: Method for curing structures using a dual photoinitiator system and a structure made using the same
- Patent Title (中): 使用双光引发剂体系固化结构的方法和使用其制造的结构
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Application No.: US14255623Application Date: 2014-04-17
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Publication No.: US09096722B2Publication Date: 2015-08-04
- Inventor: Sophia S. Yang , Alan J. Jacobsen , Jacob M. Hundley , Eric C. Clough
- Applicant: HRL Laboratories, LLC
- Applicant Address: US CA Malibu
- Assignee: HRL Laboratories, LLC
- Current Assignee: HRL Laboratories, LLC
- Current Assignee Address: US CA Malibu
- Agency: Christie, Parker & Hale, LLP
- Main IPC: C08F2/50
- IPC: C08F2/50 ; C08F2/46 ; A61L2/08 ; A61L24/00 ; C08G61/04 ; C08G75/14 ; C08F38/00 ; C08F16/12 ; C08F20/10 ; C08F20/54 ; C08F26/06 ; C08F36/02 ; C08G61/02
Abstract:
A monomeric formulation for fabrication of microlattice structures, the monomeric formulation including a plurality of monomers, a first photoinitiator configured to substantially activate above a wavelength of light, and a second photoinitiator configured not to substantially activate above the wavelength of light and to substantially activate below the wavelength of light.
Public/Granted literature
- US20150111979A1 METHOD FOR CURING STRUCTURES USING A DUAL PHOTOINITIATOR SYSTEM AND A STRUCTURE MADE USING THE SAME Public/Granted day:2015-04-23
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