Invention Grant
US09097971B2 Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern
有权
化合物,自由基聚合引发剂,化合物的制备方法,聚合物,抗蚀剂组合物和形成抗蚀剂图案的方法
- Patent Title: Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern
- Patent Title (中): 化合物,自由基聚合引发剂,化合物的制备方法,聚合物,抗蚀剂组合物和形成抗蚀剂图案的方法
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Application No.: US14126535Application Date: 2012-06-15
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Publication No.: US09097971B2Publication Date: 2015-08-04
- Inventor: Yoshiyuki Utsumi , Takahiro Dazai , Jun Iwashita , Kenri Konno
- Applicant: Yoshiyuki Utsumi , Takahiro Dazai , Jun Iwashita , Kenri Konno
- Applicant Address: JP Kawasaki-Shi
- Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee: TOKYO OHKA KOGYO CO., LTD.
- Current Assignee Address: JP Kawasaki-Shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2011-135672 20110617; JP2011-220101 20111004
- International Application: PCT/JP2012/065389 WO 20120615
- International Announcement: WO2012/173235 WO 20121220
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; C08F4/04 ; G03F7/039 ; C07C309/12 ; C07C381/12 ; C07C25/18

Abstract:
A compound represented by formula (I). In the formula, R1 represents a hydrocarbon group of 1 to 10 carbon atoms; Z represents a hydrocarbon group of 1 to 10 carbon atoms or a cyano group; provided that R1 and Z may be mutually bonded to form a ring; X represents a divalent linking group having any one selected from —O—C(═O)—, —NH—C(═O)— and —NH—C(═NH)— on a terminal that comes into contact with Q; p represents an integer of 1 to 3; Q represents a hydrocarbon group having a valency of (p+1), provided that, when p is 1, Q may be a single bond; R2 represents a single bond, an alkylene group which may have a substituent or an arylene group which may have a substituent; q represents 0 or 1; r represents an integer of 0 to 8; and A+ represents a metal cation or an organic cation.
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