Invention Grant
- Patent Title: Method for preparing a relief printing form
- Patent Title (中): 浮雕印版的制作方法
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Application No.: US13771310Application Date: 2013-02-20
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Publication No.: US09097974B2Publication Date: 2015-08-04
- Inventor: Edmund Francis Schieffer, Jr. , Mark R. Mazur
- Applicant: E I DU PONT DE NEMOURS AND COMPANY
- Applicant Address: US DE Wilmington
- Assignee: E I DU PONT DE NEMOURS AND COMPANY
- Current Assignee: E I DU PONT DE NEMOURS AND COMPANY
- Current Assignee Address: US DE Wilmington
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20
Abstract:
A relief printing form is prepared from a photosensitive element. An in-situ mask is formed and disposed above a photopolymerizable layer of the photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between about 30,000 ppm and about 7500 ppm to form at least a polymerized portion and an unpolymerized portion of the layer, and the exposed element is processed by treating with at least one washout solution selected from solvent solution, aqueous solution, semi-aqueous solution, or water.
Public/Granted literature
- US20140057208A1 METHOD FOR PREPARING A RELIEF PRINTING FORM Public/Granted day:2014-02-27
Information query
