Invention Grant
- Patent Title: Microlithography projection objective
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Application No.: US14337475Application Date: 2014-07-22
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Publication No.: US09097984B2Publication Date: 2015-08-04
- Inventor: Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B17/08
Abstract:
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
Public/Granted literature
- US20140333913A1 MICROLITHOGRAPHY PROJECTION OBJECTIVE Public/Granted day:2014-11-13
Information query
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