Invention Grant
- Patent Title: Transistor and method for manufacturing same
- Patent Title (中): 晶体管及其制造方法
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Application No.: US14661158Application Date: 2015-03-18
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Publication No.: US09099342B2Publication Date: 2015-08-04
- Inventor: Johji Nishio , Hiroshi Kono , Takuma Suzuki , Tatsuo Shimizu , Takashi Shinohe
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-170281 20120731
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L29/10 ; H01L29/66

Abstract:
According to one embodiment, a transistor includes: a structural body; an insulating film; a control electrode; a first electrode; and a second electrode. The structural body includes a first through a third semiconductor regions, and includes a compound semiconductor having a first and a second elements. The first electrode is electrically continuous with the third semiconductor region. The second electrode is electrically continuous with the first semiconductor region. The structural body has a first region provided above a lower end of the second semiconductor region and a second region other than the first region. The first region is a region formed by making a ratio of concentration of source gas of the second element to concentration of source gas of the first element larger than 1.0. Impurity concentration of the first conductivity type in the first region is higher than that in the second region.
Public/Granted literature
- US20150194488A1 TRANSISTOR AND METHOD FOR MANUFACTURING SAME Public/Granted day:2015-07-09
Information query
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