Invention Grant
- Patent Title: Semiconductor light-emitting device and the manufacturing method thereof
- Patent Title (中): 半导体发光器件及其制造方法
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Application No.: US13193970Application Date: 2011-07-29
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Publication No.: US09099612B2Publication Date: 2015-08-04
- Inventor: Min-Hsun Hsieh , Wei-Yu Chen , Li-Ming Chang , Chien-Yuan Wang , Chiu-Lin Yao
- Applicant: Min-Hsun Hsieh , Wei-Yu Chen , Li-Ming Chang , Chien-Yuan Wang , Chiu-Lin Yao
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Ditthavong & Steiner, P.C.
- Priority: TW99125582A 20100730
- Main IPC: H01L33/38
- IPC: H01L33/38 ; H01L33/24

Abstract:
This application provides a semiconductor light-emitting device and the manufacturing method thereof. The semiconductor light-emitting device comprises a semiconductor light-emitting structure and a thinned substrate. The semiconductor light-emitting structure comprises a plurality of semiconductor layers and a plurality of first channels, wherein a plurality of first channels has a predetermined depth that penetrating at least two layers of the plurality of semiconductor layers.
Public/Granted literature
- US20120025250A1 SEMICONDUCTOR LIGHT-EMITTING DEVICE AND THE MANUFACTURING METHOD THEREOF Public/Granted day:2012-02-02
Information query
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