Invention Grant
- Patent Title: Gas mist pressure bathing system
- Patent Title (中): 气雾压浴系统
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Application No.: US13261026Application Date: 2011-06-29
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Publication No.: US09101526B2Publication Date: 2015-08-11
- Inventor: Shoichi Nakamura
- Applicant: Shoichi Nakamura
- Applicant Address: JP Tokyo JP Higashichikuma-gun, Nagano
- Assignee: ACP JAPAN CO., LTD.,Shoichi Nakamura
- Current Assignee: ACP JAPAN CO., LTD.,Shoichi Nakamura
- Current Assignee Address: JP Tokyo JP Higashichikuma-gun, Nagano
- Agent Manabu Kanesaka
- Priority: JP2010-150850 20100701
- International Application: PCT/JP2011/064968 WO 20110629
- International Announcement: WO2012/002461 WO 20120105
- Main IPC: A61H35/00
- IPC: A61H35/00 ; A61H33/06 ; A61H33/14

Abstract:
A gas mist pressure bathing system for preparing a gas mist by pulverizing and dissolving a gas including carbon dioxide or oxygen or a mixed gas of carbon dioxide and oxygen, and a liquid, and causing the gas mist to directly contact skin and mucous membrane of a living organism, includes a gas supply device, a gas mist generating device having a liquid storage, a nozzle discharging the gas, and a liquid sucking pipe for sending the liquid to the nozzle, a covering member for covering the skin and mucous membrane, sensors, and a control device. The gas mist generating device further includes a gas introduction device for supplying the gas into the gas mist generating device, and generating an air current guiding the gas mist to the covering member to increase supplying pressure of the gas mist into the covering member.
Public/Granted literature
- US20120157910A1 GAS MIST PRESSURE BATHING SYSTEM Public/Granted day:2012-06-21
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