Invention Grant
US09101954B2 Geometries and patterns for surface texturing to increase deposition retention
有权
用于表面纹理的几何图形和图案，以增加沉积保持力
- Patent Title: Geometries and patterns for surface texturing to increase deposition retention
- Patent Title (中): 用于表面纹理的几何图形和图案，以增加沉积保持力
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Application No.: US14029108Application Date: 2013-09-17
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Publication No.: US09101954B2Publication Date: 2015-08-11
- Inventor: Jianqi Wang , William Ming-ye Lu , Yukari Nishimura , Joseph F. Sommers , Sio On Lo , Rajan Balesan
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; B05C21/00
Abstract:
A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.
Public/Granted literature
- US20150079336A1 GEOMETRIES AND PATTERNS FOR SURFACE TEXTURING TO INCREASE DEPOSITION RETENTION Public/Granted day:2015-03-19
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