Invention Grant
- Patent Title: Silicon carbide semiconductor device and manufacturing method of the same
- Patent Title (中): 碳化硅半导体器件及其制造方法相同
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Application No.: US14197542Application Date: 2014-03-05
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Publication No.: US09105558B2Publication Date: 2015-08-11
- Inventor: Jun Kawai , Kazuhiko Sugiura
- Applicant: DENSO CORPORATION
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: Posz Law Group, PLC
- Priority: JP2013-80433 20130408
- Main IPC: H01L29/15
- IPC: H01L29/15 ; H01L29/16 ; H01L21/02

Abstract:
A silicon carbide semiconductor device includes: a semiconductor substrate made of silicon carbide single crystal and having a principal surface and a backside; and an ohmic electrode contacting one of the principal surface and the backside of the semiconductor substrate in an ohmic manner. A boundary between the ohmic electrode and the one of the principal surface and the backside of the semiconductor substrate is terminated with an element, which has a Pauling electronegativity larger than silicon and a binding energy with silicon larger than a binding energy of Si—H.
Public/Granted literature
- US20140299886A1 SILICON CARBIDE SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME Public/Granted day:2014-10-09
Information query
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