Invention Grant
- Patent Title: Liquid processing apparatus and liquid processing method
- Patent Title (中): 液体处理装置和液体处理方法
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Application No.: US14241574Application Date: 2012-10-23
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Publication No.: US09105671B2Publication Date: 2015-08-11
- Inventor: Norihiro Itoh , Kazuhiro Aiura
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Minato-Ku
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Minato-Ku
- Agency: Burr & Brown, PLLC
- Priority: JP2011-232862 20111024
- International Application: PCT/JP2012/077317 WO 20121023
- International Announcement: WO2013/061950 WO 20130502
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02 ; B08B3/04 ; B05D1/02 ; B05C9/06 ; B05C11/10 ; B05B3/18 ; B05B15/12 ; B61H5/00 ; F16D66/02 ; G01B11/30 ; G01B21/20 ; B60B17/00 ; F16D65/12 ; F16D65/02

Abstract:
A liquid processing apparatus includes a substrate retaining part that retains a substrate in a horizontal position and rotates the substrate, first and second processing liquid supply nozzles disposed to supply first and second processing liquids, respectively, to the substrate, liquid receiving cups disposed to appropriately position an upper end thereof above the substrate and to receive the first or second processing liquid that has been supplied to the substrate, a first tubular outer cup including an upper opening and disposed around the liquid receiving cup, vertically movable between a lifted position to which the first tubular outer cup is lifted so that its upper end is positioned above the liquid receiving cup, and a lowered position lower than the lifted position, and a second tubular outer cup disposed externally to the first tubular outer cup. The tubular outer cup is selected according to the kind of processing liquid.
Public/Granted literature
- US20140352726A1 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD Public/Granted day:2014-12-04
Information query
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