Invention Grant
- Patent Title: Polycrystalline-type solar cell panel and process for production thereof
- Patent Title (中): 多晶型太阳能电池板及其制造方法
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Application No.: US13635962Application Date: 2011-06-17
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Publication No.: US09105803B2Publication Date: 2015-08-11
- Inventor: Ichiro Nakayama , Hitoshi Yamanishi , Yoshihisa Ohido , Nobuyuki Kamikihara , Tomohiro Okumura
- Applicant: Ichiro Nakayama , Hitoshi Yamanishi , Yoshihisa Ohido , Nobuyuki Kamikihara , Tomohiro Okumura
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Panasonic Patent Center
- Priority: JP2010-137947 20100617; JP2010-137948 20100617; JP2010-137949 20100617
- International Application: PCT/JP2011/003476 WO 20110617
- International Announcement: WO2011/158514 WO 20111222
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/0368

Abstract:
Disclosed is a polycrystalline-type silicon solar cell which can be produced at low cost by forming a polycrystalline silicon film having a PN junction in a simple manner. Specifically, an amorphous silicon film produced by sputtering using a dopant-containing silicon target is polycrystallized with plasma, and a PN junction is formed in the amorphous silicon film, thereby producing a polycrystalline silicon film having a PN junction. The polycrystalline silicon film having a PN junction is used as a silicon substrate for a polycrystalline-type silicon solar cell. Also disclosed is a technique for producing a dopant-containing silicon target from a silicon ingot.
Public/Granted literature
- US20130081694A1 POLYCRYSTALLINE-TYPE SOLAR CELL PANEL AND PROCESS FOR PRODUCTION THEREOF Public/Granted day:2013-04-04
Information query
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