Invention Grant
US09107291B2 Formation of a composite pattern including a periodic pattern self-aligned to a prepattern
有权
形成一个复合图案,它包括一个与原图形自对齐的周期性图案
- Patent Title: Formation of a composite pattern including a periodic pattern self-aligned to a prepattern
- Patent Title (中): 形成一个复合图案,它包括一个与原图形自对齐的周期性图案
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Application No.: US13683447Application Date: 2012-11-21
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Publication No.: US09107291B2Publication Date: 2015-08-11
- Inventor: Joy Cheng , Gregory S. Doerk , Charles T. Rettner , Daniel P. Sanders
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Main IPC: G03F7/38
- IPC: G03F7/38 ; H05K3/00

Abstract:
A chemical pattern layer including an orientation control material and a prepattern material is formed over a substrate. The chemical pattern layer includes alignment-conferring features and additional masking features. A self-assembling material is applied and self-aligned over the chemical pattern layer. The polymeric block components align to the alignment-conferring features, while the alignment is not altered by the additional masking features. A first polymeric block component is removed selective to a second polymeric block component by an etch to form second polymeric block component portions having a pattern. A composite pattern of the pattern of an etch-resistant material within the chemical pattern layer and the pattern of the second polymeric block component portions can be transferred into underlying material layers employing at least another etch.
Public/Granted literature
- US20150195916A1 FORMATION OF A COMPOSITE PATTERN INCLUDING A PERIODIC PATTERN SELF-ALIGNED TO A PREPATTERN Public/Granted day:2015-07-09
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