Invention Grant
- Patent Title: Method for chemical mechanical polishing layer pretexturing
- Patent Title (中): 化学机械抛光层预处理方法
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Application No.: US13561282Application Date: 2012-07-30
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Publication No.: US09108293B2Publication Date: 2015-08-18
- Inventor: John Henry Nunley, Jr. , Andrew M Geiger , Jeffrey Benedict
- Applicant: John Henry Nunley, Jr. , Andrew M Geiger , Jeffrey Benedict
- Applicant Address: US DE Newark
- Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Current Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Current Assignee Address: US DE Newark
- Agent Thomas S. Deibert
- Main IPC: B24B53/017
- IPC: B24B53/017 ; B24B7/22
Abstract:
A method for pretexturing the polishing surface of a chemical mechanical polishing layer, comprising providing a chemical mechanical polishing layer having a polishing surface; providing a belt sanding machine; feeding the chemical mechanical polishing layer through a gap between a transport belt and a calibrating sanding belt of the belt sanding machine; and, wherein the polishing surface comes into contact with the calibrating sanding belt; wherein the thickness of the polishing layer is reduced.
Public/Granted literature
- US20140030961A1 Method for chemical mechanical polishing layer pretexturing Public/Granted day:2014-01-30
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