Invention Grant
- Patent Title: Liquid droplet discharge device and method of manufacturing liquid droplet discharge device
- Patent Title (中): 液滴喷出装置及液滴喷出装置的制造方法
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Application No.: US13864790Application Date: 2013-04-17
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Publication No.: US09108413B2Publication Date: 2015-08-18
- Inventor: Junichi Takeuchi
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2012-094516 20120418
- Main IPC: B41J2/165
- IPC: B41J2/165 ; B41J2/135 ; B41J2/14 ; B41J2/16
Abstract:
In a liquid droplet discharge head, a liquid repellent layer is continuously formed from a liquid droplet discharge surface to a middle position in a thickness direction of an end surface of a nozzle plate.
Public/Granted literature
- US20130278673A1 LIQUID DROPLET DISCHARGE DEVICE AND METHOD OF MANUFACTURING LIQUID DROPLET DISCHARGE DEVICE Public/Granted day:2013-10-24
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