Invention Grant
- Patent Title: Metal heterocyclic compounds for deposition of thin films
- Patent Title (中): 用于沉积薄膜的金属杂环化合物
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Application No.: US14147168Application Date: 2014-01-03
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Publication No.: US09109281B2Publication Date: 2015-08-18
- Inventor: Julien Gatineau , Kazutaka Yanagita , Shingo Okubo
- Applicant: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Applicant Address: FR Paris
- Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Current Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Current Assignee Address: FR Paris
- Agent Patricia E. McQueeney
- Main IPC: C30B23/00
- IPC: C30B23/00 ; C30B25/00 ; C30B28/12 ; C30B28/14 ; C23C16/18 ; C01G23/00 ; C01G25/02 ; C23C16/34 ; C23C16/40
Abstract:
Methods and compositions for depositing a metal containing film on a substrate are disclosed. A reactor and at least one substrate disposed in the reactor are provided. A metal containing precursor is provided and introduced into the reactor, which is maintained at a temperature of at least 100° C. A metal is deposited on to the substrate through a deposition process to form a thin film on the substrate.
Public/Granted literature
- US20140119977A1 METAL HETEROCYCLIC COMPOUNDS FOR DEPOSITION OF THIN FILMS Public/Granted day:2014-05-01
Information query
