Invention Grant
- Patent Title: Plasma tuning rods in microwave resonator plasma sources
- Patent Title (中): 微波谐振器等离子体源中的等离子体调谐棒
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Application No.: US13249560Application Date: 2011-09-30
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Publication No.: US09111727B2Publication Date: 2015-08-18
- Inventor: Jianping Zhao , Lee Chen , Merritt Funk , Toshihiko Iwao , Peter L.G. Ventzek
- Applicant: Jianping Zhao , Lee Chen , Merritt Funk , Toshihiko Iwao , Peter L.G. Ventzek
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evans, LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306 ; H01J37/32

Abstract:
The invention provides a plurality of resonator subsystems. The resonator subsystems can comprise one or more resonant cavities configured to couple electromagnetic (EM) energy in a desired EM wave mode to plasma by generating resonant microwave energy in a resonant cavity adjacent the plasma. The resonator subsystem can be coupled to a process chamber using one or more interface subsystems and can comprise one or more resonant cavities, and each resonant cavity can have a plurality of plasma tuning rods coupled thereto. Some of the plasma tuning rods can be configured to couple the EM-energy from one or more of the resonant cavities to the process space within the process chamber.
Public/Granted literature
- US20130082030A1 Plasma Tuning Rods in Microwave Resonator Plasma Sources Public/Granted day:2013-04-04
Information query
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