Invention Grant
US09111858B2 Non-volatile semiconductor memory device and method for manufacturing the same 有权
非易失性半导体存储器件及其制造方法

Non-volatile semiconductor memory device and method for manufacturing the same
Abstract:
A non-volatile semiconductor memory device includes a cell array layer including a first wire, one or more memory cells stacked on the first wire, and a second wire formed on the memory cell so as to cross the first wire, wherein the memory cell includes a current rectifying element and a variable resistance element, and an atomic composition ratio of nitrogen is higher than that of oxygen in a part of a sidewall of the current rectifying element.
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