Invention Grant
- Patent Title: Non-volatile semiconductor memory device and method for manufacturing the same
- Patent Title (中): 非易失性半导体存储器件及其制造方法
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Application No.: US13838722Application Date: 2013-03-15
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Publication No.: US09111858B2Publication Date: 2015-08-18
- Inventor: Jun Nishimura , Nobuaki Yasutake , Kei Sakamoto , Takayuki Okamura
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-068423 20120323
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L27/24 ; H01L45/00

Abstract:
A non-volatile semiconductor memory device includes a cell array layer including a first wire, one or more memory cells stacked on the first wire, and a second wire formed on the memory cell so as to cross the first wire, wherein the memory cell includes a current rectifying element and a variable resistance element, and an atomic composition ratio of nitrogen is higher than that of oxygen in a part of a sidewall of the current rectifying element.
Public/Granted literature
- US20130277640A1 NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2013-10-24
Information query
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