Invention Grant
US09111940B2 Repairing method, repairing structure, and repairing system for disconnected defect 有权
修复方法,修理结构和修复系统的断线缺陷

Repairing method, repairing structure, and repairing system for disconnected defect
Abstract:
The present disclosure provides a repairing method, a repairing structure and a repairing system for a disconnected defect, the repairing method includes: forming a first repairing line connecting two ends of a disconnected portion of a scanning line; forming an insulation layer covering the first repairing line; and forming a second repairing line connecting two ends of a disconnected portion of a data line with the insulation layer located at an intersection of the first repairing line and the second repairing line. By forming the insulation layer between the first repairing line and the second repairing line, the present disclosure avoids the short circuit generated after the scanning line and the data line are repaired, repairs the disconnected defect at the intersection of two metal layers, improves the yield rate of the repairing of the disconnected defect, and reduces manufacturing cost.
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