Invention Grant
US09111987B2 Method of manufacturing a bipolar transistor, bipolar transistor and integrated circuit
有权
制造双极晶体管,双极晶体管和集成电路的方法
- Patent Title: Method of manufacturing a bipolar transistor, bipolar transistor and integrated circuit
- Patent Title (中): 制造双极晶体管,双极晶体管和集成电路的方法
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Application No.: US14259550Application Date: 2014-04-23
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Publication No.: US09111987B2Publication Date: 2015-08-18
- Inventor: Evelyne Gridelet , Johannes Donkers , Petrus Hubertus Cornelis Magnee , Viet Dinh , Tony Vanhoucke
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP, B.V.
- Current Assignee: NXP, B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP13166124 20130501
- Main IPC: H01L21/331
- IPC: H01L21/331 ; H01L27/082 ; H01L29/70 ; H01L29/732 ; H01L29/40 ; H01L29/66 ; H01L29/737

Abstract:
Consistent with an example embodiment, a bipolar transistor comprises an emitter region vertically separated from a collector region in a substrate by a base region. The bipolar transistor further comprises a field plate electrically connected to the emitter region; the field plate extends from the emitter region along the base region into the collector region and the field plate is laterally electrically insulated from the base region and the collector region by a spacer. The spacer comprises an electrically isolating material that includes a silicon nitride layer and is vertically electrically isolated from the substrate by a further electrically isolating material.
Public/Granted literature
- US20140327110A1 METHOD OF MANUFACTURING A BIPOLAR TRANSISTOR, BIPOLAR TRANSISTOR AND INTEGRATED CIRCUIT Public/Granted day:2014-11-06
Information query
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