Invention Grant
- Patent Title: Display device and manufacturing method thereof
- Patent Title (中): 显示装置及其制造方法
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Application No.: US14515570Application Date: 2014-10-16
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Publication No.: US09117732B2Publication Date: 2015-08-25
- Inventor: Shunpei Yamazaki
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2010-012663 20100124
- Main IPC: G02F1/136
- IPC: G02F1/136 ; H01L33/00 ; H01L27/15 ; G02F1/1368 ; H01L27/12 ; H01L29/66 ; H01L29/786 ; G02F1/1333 ; G02F1/1362 ; H01L29/12 ; G02F1/1335 ; G09G3/34 ; G09G3/36 ; H01L27/32

Abstract:
Disclosed is a display device including a transistor showing extremely low off current. In order to reduce the off current, a semiconductor material whose band gap is greater than that of a silicon semiconductor is used for forming a transistor, and the concentration of an impurity which serves as a carrier donor of the semiconductor material is reduced. Specifically, an oxide semiconductor whose band gap is greater than or equal to 2 eV, preferably greater than or equal to 2.5 eV, more preferably greater than or equal to 3 eV is used for a semiconductor layer of a transistor, and the concentration of an impurity which serves as a carrier donor included is reduced. Consequently, the off current of the transistor per micrometer in channel width can be reduced to lower than 10 zA/μm at room temperature and lower than 100 zA/μm at 85° C.
Public/Granted literature
- US20150034951A1 DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2015-02-05
Information query
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