Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
- Patent Title (中): 半导体装置及其制造方法
-
Application No.: US14244719Application Date: 2014-04-03
-
Publication No.: US09117879B2Publication Date: 2015-08-25
- Inventor: Cheng-Ying Ho , Wen-De Wang , Jen-Cheng Liu , Dun-Nian Yaung
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agent Chun-Ming Shih
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/762 ; H01L23/522 ; H01L23/00

Abstract:
A semiconductor device includes a first semiconductor chip comprising a first metallic structure, a top surface, and a bottom surface, a second semiconductor chip comprising a second metallic structure, wherein the second semiconductor chip is bonded with the first semiconductor chip on the bottom surface, a conductive material connecting the first metallic structure and the second metallic structure, wherein a portion of the conductive material is inside the first semiconductor chip and the second semiconductor chip, and a dielectric layer disposed surrounding the portion of the conductive material.
Public/Granted literature
- US20150187636A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2015-07-02
Information query
IPC分类: