Invention Grant
US09117879B2 Semiconductor device and manufacturing method thereof 有权
半导体装置及其制造方法

Semiconductor device and manufacturing method thereof
Abstract:
A semiconductor device includes a first semiconductor chip comprising a first metallic structure, a top surface, and a bottom surface, a second semiconductor chip comprising a second metallic structure, wherein the second semiconductor chip is bonded with the first semiconductor chip on the bottom surface, a conductive material connecting the first metallic structure and the second metallic structure, wherein a portion of the conductive material is inside the first semiconductor chip and the second semiconductor chip, and a dielectric layer disposed surrounding the portion of the conductive material.
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